검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Double-layer inorganic antireflective system for KrF lithography Xu M, Ko TM Journal of Vacuum Science & Technology B, 18(1), 127, 2000 |
| 2 |
Application of a thin-resist process for KrF imaging to 130 nm device fabrication Azuma T, Chiba K, Kawamura D, Miyoshi S, Ozaki T, Kageyama H Journal of Vacuum Science & Technology B, 17(6), 2519, 1999 |
| 3 |
Resist design for resolution limit of KrF imaging towards 130 nm lithography Azuma T, Kawamura D, Matsunaga K, Shiobara E, Tanaka S, Onishi Y Journal of Vacuum Science & Technology B, 16(6), 3734, 1998 |
| 4 |
Self-Developing Characteristics of Si Containing Polymers and Their Application to X-Ray-Lithography Yamaguchi A, Ogawa T, Tachibana H, Oizumi H, Soga T, Matsumoto M, Matsuzaka T, Takeda E Journal of the Electrochemical Society, 143(2), 657, 1996 |