검색결과 : 15건
| No. | Article |
|---|---|
| 1 |
Homoepitaxial HVPE GaN: A potential substrate for high performance devices Freitas JA, Culbertson JC, Mahadik NA, Tadjer MJ, Wu S, Raghothamachar B, Dudley M, Sochacki T, Bockowski M Journal of Crystal Growth, 500, 104, 2018 |
| 2 |
Efficient iron doping of HVPE GaN Freitas JA, Culbertson JC, Glaser ER, Richter E, Weyers M, Oliveira AC, Garg VK Journal of Crystal Growth, 500, 111, 2018 |
| 3 |
Substrate and annealing temperature dependent electrical resistivity of sputtered titanium nitride thin films Kearney BT, Jugdersuren B, Culbertson JC, Desario PA, Liu X Thin Solid Films, 661, 78, 2018 |
| 4 |
Nanoscale zinc silicate from phytoliths Qadri SB, Gorzkowski EP, Rath BB, Feng CR, Amarasinghe R, Freitas JA, Culbertson JC, Wollmershauser JA Journal of Crystal Growth, 476, 25, 2017 |
| 5 |
Incorporation of pervasive impurities on HVPE GaN growth directions Freitas JA, Culbertson JC, Mahadik NA, Glaser ER, Sochacki T, Bockowski M, Lee SK, Shim KB Journal of Crystal Growth, 456, 101, 2016 |
| 6 |
HVPE GaN wafers with improved crystalline and electrical properties Freitas JA, Culbertson JC, Mahadik NA, Sochacki T, Iwinska M, Bockowski MS Journal of Crystal Growth, 456, 113, 2016 |
| 7 |
Large-Area Synthesis of Continuous and Uniform MoS2 Monolayer Films on Graphene McCreary KM, Hanbicki AT, Robinson JT, Cobas E, Culbertson JC, Friedman AL, Jernigan GG, Jonker BT Advanced Functional Materials, 24(41), 6449, 2014 |
| 8 |
Structural and optical properties of thick freestanding AlN films prepared by hydride vapor phase epitaxy Freitas JA, Culbertson JC, Mastro MA, Kumagai Y, Koukitu A Journal of Crystal Growth, 350(1), 33, 2012 |
| 9 |
Dislocations in III-nitride films grown on 4H-SiC mesas with and without surface steps Bassim ND, Twigg ME, Mastro MA, Eddy CR, Zega TJ, Henry RL, Culbertson JC, Holm RT, Neudeck P, Powell JA, Trunek AJ Journal of Crystal Growth, 304(1), 103, 2007 |
| 10 |
Metal-organic chemical-vapor deposition of high-reflectance III-nitride distributed Bragg reflectors on Si substrates Mastro MA, Holm RT, Bassim ND, Gaskill DK, Culbertson JC, Fatemi M, Eddy CR, Henry RL, Twigg ME Journal of Vacuum Science & Technology A, 24(4), 1631, 2006 |