검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Feasibility of gate patterning by using a hard mask on 0.25 mu m technology and below Lee HC, Creusen M, Vanhaelemeersch S Journal of Vacuum Science & Technology B, 16(5), 2763, 1998 |
| No. | Article |
|---|---|
| 1 |
Feasibility of gate patterning by using a hard mask on 0.25 mu m technology and below Lee HC, Creusen M, Vanhaelemeersch S Journal of Vacuum Science & Technology B, 16(5), 2763, 1998 |