화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Deposition of a Continuous and Conformal Copper Seed Layer by a Large-Area Electron Cyclotron Resonance Plasma Source with Embedded Lisitano Antenna
Jang SO, You HJ, Kim YW, Jung YH, Hwang IU, Park JY, Lee H
Plasma Chemistry and Plasma Processing, 34(1), 229, 2014
2 Fabrication and characterization of a Cu seed layer on a 60-nm trench-patterned SiO2 substrate by a self-assembled-monolayer (SAM) process
Han WK, Hwang GH, Hong SJ, Yoon CS, Park JS, Cho JK, Kang SG
Applied Surface Science, 255(12), 6082, 2009
3 Customized step coverage of copper seed layer using Eni-PVD (energetic neutral and ion physical vapor deposition)
Lim ST, Park YC, Yoo SJ, Lee BJ
Thin Solid Films, 517(14), 3935, 2009
4 갈바니 치환 증착 방법을 이용한 확산방지막 위에서의 구리 시드층 형성
김재정, 강무성
HWAHAK KONGHAK, 39(6), 721, 2001