화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Profile simulation of high aspect ratio contact etch
Kim D, Hudson EA, Cooperberg D, Edelberg E, Srinivasan M
Thin Solid Films, 515(12), 4874, 2007
2 Feature-scale model of Si etching in SF6 plasma and comparison with experiments
Belen RJ, Gomez S, Kiehlbauch M, Cooperberg D, Aydil ES
Journal of Vacuum Science & Technology A, 23(1), 99, 2005
3 Feature-scale model of Si etching in SF6/O-2 plasma and comparison with experiments
Belen RJ, Gomez S, Cooperberg D, Kiehlbauch M, Aydil ES
Journal of Vacuum Science & Technology A, 23(5), 1430, 2005