검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Mask charging and profile evolution during chlorine plasma etching of silicon Bogart KHA, Klemens FP, Malyshev MV, Colonell JI, Donnelly VM, Lee JTC, Lane JM Journal of Vacuum Science & Technology A, 18(1), 197, 2000 |
| 2 |
Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage Malyshev MV, Donnelly VM, Downey SW, Colonell JI, Layadi N Journal of Vacuum Science & Technology A, 18(3), 849, 2000 |
| 3 |
Reduction of plasma induced damage in an inductively coupled plasma using pulsed source power Samukawa S, Noguchi K, Colonell JI, Bogart KHA, Malyshev MV, Donnelly VM Journal of Vacuum Science & Technology B, 18(2), 834, 2000 |
| 4 |
Langmuir probe studies of a transformer-coupled plasma, aluminum etcher Malyshev MV, Donnelly VM, Kornblit A, Ciampa NA, Colonell JI, Lee JTC Journal of Vacuum Science & Technology A, 17(2), 480, 1999 |
| 5 |
Dynamics of No Reduction by H-2 on Rh(111) - Velocity and Angular-Distributions of the N-2 Product Colonell JI, Gibson KD, Sibener SJ Journal of Chemical Physics, 104(17), 6822, 1996 |
| 6 |
Carbon-Monoxide Oxidation on Rh(111) - Velocity and Angular-Distributions of the CO2 Product Colonell JI, Gibson KD, Sibener SJ Journal of Chemical Physics, 103(15), 6677, 1995 |
| 7 |
Oxidation of H on Rh(111) - H2O Product Velocity and Angular-Distributions Gibson KD, Colonell JI, Sibener SJ Journal of Chemical Physics, 103(15), 6735, 1995 |