| 1 |
Characterization of HfOxNy thin film formation by in-situ plasma enhanced atomic layer deposition using NH3 and N-2 plasmas
Lee YB, Oh IK, Cho EN, Moon P, Kim H, Yun I
Applied Surface Science, 349, 757, 2015 |
| 2 |
Electrode metal penetration of amorphous indium gallium zinc oxide semiconductor thin film transistors
Ka J, Cho EN, Lee MJ, Myoung JM, Yun I
Current Applied Physics, 15(6), 675, 2015 |
| 3 |
Spectroscopic ellipsometry modeling of ZnO thin films with various O-2 partial pressures
Cho EN, Park S, Yun I
Current Applied Physics, 12(6), 1606, 2012 |
| 4 |
Investigation on the relationship between channel resistance and subgap density of states of amorphous InGaZnO thin film transistors
Park S, Cho EN, Yun I
Solid-State Electronics, 75, 93, 2012 |
| 5 |
Contact resistance dependent scaling-down behavior of amorphous InGaZnO thin-film transistors
Cho EN, Kang JH, Yun I
Current Applied Physics, 11(4), 1015, 2011 |
| 6 |
CHFR functions as a ubiquitin ligase for HLTF to regulate its stability and functions
Kim JM, Cho EN, Kwon YE, Bae SJ, Kim M, Seol JH
Biochemical and Biophysical Research Communications, 395(4), 515, 2010 |
