검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Effect of fluorine flow and deposition temperature on physical characteristics and stability of fluorine-doped siloxane-based low-dielectric-constant material Cheng YL, Wu J, Chiu TJ Journal of Vacuum Science & Technology A, 28(3), 456, 2010 |
| 2 |
Effect of copper barrier dielectric deposition process on characterization of copper interconnect Cheng YL, Chiu TJ, Wei BJ, Wang HJ, Wu J, Wang YL Journal of Vacuum Science & Technology B, 28(3), 567, 2010 |
| 3 |
Electrical and reliability performances of nitrogen-incorporated silicon carbide dielectric by chemical vapor deposition Cheng YL, Chen SA, Chiu TJ, Wu J, Wei BJ, Chang HJ Journal of Vacuum Science & Technology B, 28(3), 573, 2010 |