| 1 |
Photoinduced Mesoporosity of Tert-Butoxycarbonyl Acrylic Photosensitive Material with Low Dielectric Constant
Lin SS, Chan YJ, Lee YD
Journal of Applied Polymer Science, 127(4), 3269, 2013 |
| 2 |
Recent progress in negative-working photosensitive and thermally stable polymers
Higashihara T, Saito Y, Mizoguchi K, Ueda M
Reactive & Functional Polymers, 73(2), 303, 2013 |
| 3 |
Removal of Negative-tone Novolak Chemical Amplification Resist by Chemicals
Kono A, Yada K, Horibe H, Ota H, Yanagi M
KAGAKU KOGAKU RONBUNSHU, 36(6), 589, 2010 |
| 4 |
A positive-working photosensitive polyimide based on thermal cross-linking and acidolytic cleavage
Jung MS, Hyeon-Lee J, Choi TL
Journal of Applied Polymer Science, 107(4), 2632, 2008 |
| 5 |
Transient Protection of Intramolecular Hydrogen Bonding: A Simple but Elegant Approach for Functional Imaging
Kim JM, Min SJ, Park BJ, Lee JH, Ahn KD
Macromolecular Research, 12(5), 493, 2004 |
| 6 |
Chemical amplification resists: Inception, implementation in device manufacture, and new developments
Ito H
Journal of Polymer Science Part A: Polymer Chemistry, 41(24), 3863, 2003 |
| 7 |
The First Synthesis of a Transition Metal-Catalyzed Homopolymer Having Pendent t-Boc-Protected Quinizarin for Patterned Fluorescence Images
Yoo J, Lee JH, Cho I, Ahn KD, Kim JM
Macromolecular Research, 11(1), 69, 2003 |
| 8 |
Study of the synthesis and characterization of methacrylate photoresists
Fu SC, Lin HW, Chou WY, Wang LA, Hsieh KH
Journal of Applied Polymer Science, 83(9), 1860, 2002 |
| 9 |
The kinetics of a negative-tone acrylic photoresist for 193-nm lithography
Fu SC, Hsieh KH
Journal of Polymer Science Part A: Polymer Chemistry, 38(6), 954, 2000 |
| 10 |
Control of photogenerated acid diffusion and evaporation by copolymerization with a basic monomer
Kim JB, Kwon YG, Choi JH, Jung MH
Journal of Vacuum Science & Technology B, 17(5), 2097, 1999 |
