화학공학소재연구정보센터
검색결과 : 25건
No. Article
1 Edge termination strategies for a 4 kV 4H-SiC thyristor
Brosselard P, Planson D, Scharnholz S, Raynaud C, Zorngiebel V, Lazar M, Chante JP, Spahn E
Solid-State Electronics, 50(7-8), 1183, 2006
2 P-type SiC layers formed by VLS induced selective epitaxial growth
Lazar M, Jacquier C, Dubois C, Raynaud C, Ferro G, Planson D, Brosselard P, Monteil Y, Chante JP
Materials Science Forum, 483, 633, 2005
3 A 3.5 kV thyristor in 4H-SiC with a JTE periphery
Brosselard P, Bouchet T, Planson D, Scharnholz S, Paques G, Lazar M, Raynaud C, Chante JP, Spahn E
Materials Science Forum, 483, 1005, 2005
4 SiC-based current limiter devices
Chante JP, Tournier D, Planson D, Raynaud C, Lazar M, Locatelli ML, Brosselard P
Materials Science Forum, 457-460, 951, 2004
5 On-chip temperature monitoring of a SiC current limiter
Tournier D, Godignon P, Millan J, Planson D, Chante JP, Sarrus F, de Palma JF
Materials Science Forum, 457-460, 1021, 2004
6 The role of the ion implanted emitter state on 6H-SiC power diodes behavior. A statistical study
Lazar M, Cardinali G, Raynaud C, Poggi A, Planson D, Nipoti R, Chante JP
Materials Science Forum, 457-460, 1025, 2004
7 Design, fabrication and characterization of 5 kV 4H-SiC p(+)n planar bipolar diodes protected by junction termination extension
Raynaud C, Lazar M, Planson D, Chante JP, Sassi Z
Materials Science Forum, 457-460, 1033, 2004
8 Influence of different peripheral protections on the breakover voltage of a 4H-SiC GTO thyristor
Brosselard P, Zorngiebel V, Planson D, Scharnholz S, Chante JP, Spahn E, Raynaud C, Lazar M
Materials Science Forum, 457-460, 1129, 2004
9 Characteristics of 6H-SiC bipolar JTE diodes realized by sublimation epitaxy and Al implantation
Strel'chuk AM, Lebedev AA, Davydov DV, Savkina NS, Kuznetsov AN, Valakh MY, Kiselev VS, Romanyuk BN, Raynaud C, Chante JP, Locatelli ML
Materials Science Forum, 457-460, 1133, 2004
10 A comparative study of high-temperature aluminum post-implantation annealing in 6H-and 4H-SiC, non-uniform temperature effects
Lazar M, Raynaud C, Planson D, Locatelli ML, Isoird K, Ottaviani L, Chante JP, Nipoti R, Poggi A, Cardinali G
Materials Science Forum, 389-3, 827, 2002