검색결과 : 36건
No. | Article |
---|---|
1 |
Effect of residual H2O on epitaxial AN film growth on 4H-SiC by alternating doses of TMA and NH3 Perng YC, Kim T, Chang JP Applied Surface Science, 314, 1047, 2014 |
2 |
Poly(lactide-co-trimethylene carbonate) and Polylactide/Polytrimethylene Carbonate Blown Films Li HL, Chang JP, Qin YY, Wu Y, Yuan ML, Zhang YJ International Journal of Molecular Sciences, 15(2), 2608, 2014 |
3 |
Improvement of photocatalytic activity of TiO2 nanoparticles on selectively reconstructed layered double hydroxide Lu RJ, Xu X, Chang JP, Zhu Y, Xu SL, Zhang FZ Applied Catalysis B: Environmental, 111, 389, 2012 |
4 |
HfO2 and ZrO2-Based Microchemical Ion Sensitive Field Effect Transistor (ISFET) Sensors: Simulation & Experiment Jankovic V, Chang JP Journal of the Electrochemical Society, 158(10), P115, 2011 |
5 |
Patterning and Templating for Nanoelectronics Galatsis K, Wang KL, Ozkan M, Ozkan CS, Huang Y, Chang JP, Monbouquette HG, Chen Y, Nealey P, Botros Y Advanced Materials, 22(6), 769, 2010 |
6 |
Structural properties of epitaxial SrHfO3 thin films on Si (001) Sawkar-Mathur M, Marchiori C, Fompeyrine J, Toney MF, Bargar J, Chang JP Thin Solid Films, 518, S118, 2010 |
7 |
Luminescence of Nanocrystalline Erbium-Doped Yttria Mao YB, Tran T, Guo X, Huang JY, Shih CK, Wang KL, Chang JP Advanced Functional Materials, 19(5), 748, 2009 |
8 |
Plasma etching of Hf-based high-k thin films. Part I. Effect of complex ions and radicals on the surface reactions Martin RM, Chang JP Journal of Vacuum Science & Technology A, 27(2), 209, 2009 |
9 |
Plasma etching of Hf-based high-k thin films. Part II. Ion-enhanced surface reaction mechanisms Martin RM, Blom HO, Chang JP Journal of Vacuum Science & Technology A, 27(2), 217, 2009 |
10 |
Plasma etching of Hf-based high-k thin films. Part III. Modeling the reaction mechanisms Martin RM, Chang JP Journal of Vacuum Science & Technology A, 27(2), 224, 2009 |