화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Reliability characteristics of W/WN/TaOxNy/SiO2/Si metal oxide semiconductor capacitors
Cho HJ, Cha TH, Lim KY, Park DG, Kim JY, Kim JJ, Heo S, Yeo IS, Park JW
Journal of the Electrochemical Society, 149(7), G403, 2002
2 Oxidation resistance of sputtered Ti1-xAlxN films for complementary metal oxide semiconductor storage node electrode barriers
Kim SD, Hwang IS, Rhee JK, Cha TH, Kim HD
Electrochemical and Solid State Letters, 4(1), G7, 2001
3 Effects of TiN deposition on the characteristics of W/TiN/SiO2/Si metal oxide semiconductor capacitors
Park DG, Cho HJ, Lim KY, Cha TH, Yeo IS, Park JW
Journal of the Electrochemical Society, 148(9), F189, 2001
4 Characteristics of sputtered Ti1-xAlxN films for storage node electrode barriers
Park DG, Cha TH, Lee SH, Yeo IS, Park JW, Kim SD
Journal of Vacuum Science & Technology B, 19(6), 2289, 2001
5 Study on the transition temperature and phase formation sequence in TiZr silicides on Si(100)
Cha TH, Yoon SH, Lee DK, Ryu H, Lee HJ, Kim CS, Jeon HT
Journal of Vacuum Science & Technology A, 17(2), 332, 1999