검색결과 : 7건
No. | Article |
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1 |
Thermal processing of strained silicon-on-insulator for atomically precise silicon device fabrication Lee WCT, Bishop N, Thompson DL, Xue K, Scappucci G, Cederberg JG, Gray JK, Han SM, Celler GK, Carroll MS, Simmons MY Applied Surface Science, 265, 833, 2013 |
2 |
Size and Thickness Effect on the Local Strain Relaxation in Patterned Strained Silicon-on-Insulator Gu DF, Zhu MY, Celler GK, Baumgart H Electrochemical and Solid State Letters, 12(4), H113, 2009 |
3 |
Etching of silicon by the RCA Standard Clean 1 Celler GK, Barr DL, Rosamilia JM Electrochemical and Solid State Letters, 3(1), 47, 2000 |
4 |
Nanometer-Scale Dimensional Metrology for Advanced Lithography Marchman HM, Griffith JE, Guo JZ, Frackoviak J, Celler GK Journal of Vacuum Science & Technology B, 12(6), 3585, 1994 |
5 |
Wavelength Dependence of Exposure Window and Resist Profile in X-Ray-Lithography Guo JZ, Celler GK, Maldonado JR, Hector SD Journal of Vacuum Science & Technology B, 12(6), 4044, 1994 |
6 |
Patterning of X-Ray Masks Using the Negative-Acting Resist P(Si-CMS) Mixon DA, Novembre AE, Tai WW, Jurgensen CW, Frackoviak J, Trimble LE, Kola RR, Celler GK Journal of Vacuum Science & Technology B, 11(6), 2834, 1993 |
7 |
Stress and Microstructure of Sputter-Deposited Thin-Films - Molecular-Dynamics Simulations and Experiment Fang CC, Jones F, Kola RR, Celler GK, Prasad V Journal of Vacuum Science & Technology B, 11(6), 2947, 1993 |