검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Study of C4F8/CO and C4F8/Ar/CO plasmas for highly selective etching of organosilicate glass over Si3N4 and SiC Ling L, Hua X, Li X, Oehrlein GS, Celii FG, Kirmse KHR, Jiang P, Wang YC, Anderson HM Journal of Vacuum Science & Technology A, 22(2), 236, 2004 |
| 2 |
Study of C4F8/N-2 and C4F8/Ar/N-2 plasmas for highly selective organosilicate glass etching over Si3N4 and SiC Hua XF, Wang X, Fuentevilla D, Oehrlein GS, Celii FG, Kirmse KHR Journal of Vacuum Science & Technology A, 21(5), 1708, 2003 |
| 3 |
Trench etch processes for dual damascene patterning of low-k dielectrics Jiang P, Celii FG, Dostalik WW, Newton KJ, Sakima H Journal of Vacuum Science & Technology A, 19(4), 1388, 2001 |
| 4 |
Characterization of silicon-rich nitride and oxynitride films for polysilicon gate patterning. I. Physical, characterization Joseph EA, Gross C, Liu HY, Laaksonen RT, Celii FG Journal of Vacuum Science & Technology A, 19(5), 2483, 2001 |
| 5 |
Process characterization for tapered contact etch Celii FG, He Q, Liu HY, DeBord JR, Sakima H Journal of Vacuum Science & Technology B, 19(5), 1845, 2001 |
| 6 |
In-Situ Composition Monitoring of InGaAs/InP Using Quadrupole Mass-Spectrometry Celii FG, Kao YC, Liu HY Journal of Vacuum Science & Technology A, 14(6), 3202, 1996 |
| 7 |
Real-Time Monitoring of Resonant-Tunneling Diode Growth Using Spectroscopic Ellipsometry Celii FG, Kao YC, Katz AJ, Moise TS Journal of Vacuum Science & Technology A, 13(3), 733, 1995 |