검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Control of photogenerated acid diffusion and evaporation by copolymerization with a basic monomer Kim JB, Kwon YG, Choi JH, Jung MH Journal of Vacuum Science & Technology B, 17(5), 2097, 1999 |
| 2 |
Novel Postexposure Bake Simulator - First Results Capodieci L, Krasnoperova A, Cerrina F, Lyons C, Spence C, Early K Journal of Vacuum Science & Technology B, 13(6), 2963, 1995 |
| 3 |
Advanced Epoxy Novolac Resist for Fast High-Resolution Electron-Beam Lithography Argitis P, Raptis I, Aidinis CJ, Glezos N, Baciocchi M, Everett J, Hatzakis M Journal of Vacuum Science & Technology B, 13(6), 3030, 1995 |