검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Etch characteristics of Ru thin films using O-2/Ar, CH4/Ar, and O-2/CH4/Ar plasmas Hwang SM, Garay AA, Choi JH, Chung CW Thin Solid Films, 615, 311, 2016 |
| 2 |
Inductively coupled plasma reactive ion etching of magnetic tunnel junction stacks using H2O/CH4 mixture Lee TY, Lee IH, Chung CW Thin Solid Films, 547, 146, 2013 |