1 |
Visible light photocatalytic activity of TiO2 with carbon-fluorine heteroatoms simultaneously introduced by CF4 plasma Lee RE, Lim CH, Lee HR, Kim SJ, Lee YS Inpress KJChE, 1000(1000), 1, 2022 |
2 |
Plasma treatment of polymethyl methacrylate to improve surface hydrophilicity and antifouling performance Sui SY, Li L, Shen J, Ni GH, Xie HB, Lin QF, Zhao YJ, Guo JW, Duan WX Polymer Engineering and Science, 61(2), 506, 2021 |
3 |
Effective Removal of CF4 by Combining Nonthermal Plasma with -Al2O3 Pan KL, Chen YS, Chang MB Plasma Chemistry and Plasma Processing, 39(4), 877, 2019 |
4 |
Adsorption behavior of COF2 and CF4 gas on the MoS2 monolayer doped with Ni: A first-principles study Li Y, Zhang XX, Chen DC, Xiao S, Tang J Applied Surface Science, 443, 274, 2018 |
5 |
Superhydrophobic polymeric films with hierarchical structures produced by nanoimprint (NIL) and plasma roughening Durret J, Szkutnik PD, Frolet N, Labau S, Gourgon C Applied Surface Science, 445, 97, 2018 |
6 |
Chemically activated microporous carbons derived from petroleum coke: Performance evaluation for CF4 adsorption Yuan X, Choi SW, Jang E, Lee KB Chemical Engineering Journal, 336, 297, 2018 |
7 |
Sustainable degradation of carbon tetrafluoride to non-corrosive useful products by incorporating reduced electron mediator within electro-scrubbing Muthuraman G, Ramu AG, Cho YH, McAdam EJ, Moon IS Journal of Industrial and Engineering Chemistry, 63, 275, 2018 |
8 |
Improvement of contact resistance in flexible a-IGZO thin-film transistors by CF4/O-2 plasma treatment Knobelspies S, Takabayashi A, Daus A, Cantarella G, Munzenrieder N, Troster G Solid-State Electronics, 150, 23, 2018 |
9 |
CF4 plasma-modified omniphobic electrospun nanofiber membrane for produced water brine treatment by membrane distillation Woo YC, Chen Y, Tijing LD, Phuntsho S, He T, Choi JS, Kim SH, Shon HK Journal of Membrane Science, 529, 234, 2017 |
10 |
Adsorption and desorption dynamics of CF4 on activated carbon beds: Validity of the linear driving force approximation for pressure-changing steps Cho DW, Kim WS, Chang HS, Jung TS, Park JK, Park JH Korean Journal of Chemical Engineering, 34(11), 2922, 2017 |