검색결과 : 6건
No. | Article |
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1 |
Bateman in Nature: Predation on Offspring Reduces the Potential for Sexual Selection Byers J, Dunn S Science, 338(6108), 802, 2012 |
2 |
Non-natives: 141 scientists object Simberloff D, Alexander J, Allendorf F, Aronson J, Antunes PM, Bacher S, Bardgett R, Bertolino S, Bishop M, Blackburn TM, Blakeslee A, Blumenthal D, Bortolus A, Buckley R, Buckley Y, Byers J, Callaway RM, Campbell F, Campbell K, Campbell M, Carlton JT, Cassey P, Catford J, Celesti-Grapow L, Chapman J, Clark P, Clewell A, Clode JC, Chang A, Chytry M, Clout M, Cohen A, Cowan P, Cowie RH, Crall AW, Crooks J, Deveney M, Dixon K, Dobbs FC, Duffy DC, Duncan R, Ehrlich PR, Eldredge L, Evenhuis N, Fausch KD, Feldhaar H, Firn J, Fowler A, Galil B, Garcia-Berthou E, Geller J, Genovesi P, Gerber E, Gherardi F, Gollasch S, Gordon D, Graham J, Gribben P, Griffen B, Grosholz ED, Hewitt C, Hierro JL, Hulme P, Hutchings P, Jarosik V, Jeschke JM, Johnson C, Johnson L, Johnston EL, Jones CG, Keller R, King CM, Knols BGJ, Kollmann J, Kompas T, Kotanen PM, Kowarik I, Kuhn I, Kumschick S, Leung B, Liebhold A, MacIsaac H, Mack R, McCullough DG, McDonald R, Merritt DM, Meyerson L, Minchin D, Mooney HA, Morisette JT, Moyle P, Heinz MS, Murray BR, Nehring S, Nelson W, Nentwig W, Novak SJ, Occhipinti A, Ojaveer H, Osborne B, Ostfeld RS, Parker J, Pederson J, Pergl J, Phillips ML, Pysek P, Rejmanek M, Ricciardi A, Ricotta C, Richardson D, Rilov G, Ritchie E, Robertson PA, Roman J, Ruiz G, Schaefer H, Schaffelke B, Schierenbeck KA, Schmitz DC, Schwindt E, Seeb J, Smith LD, Smith GF, Stohlgren T, Strayer DL, Strong D, Sutherland WJ, Therriault T, Thuiller W, Torchin M, van der Putten WH, Vila M, Von Holle B, Wallentinus I, Wardle D, Williamson M, Wilson J, Winter M, Wolfe LM, Wright J, Wonham M, Zabin C Nature, 475(7354), 36, 2011 |
3 |
Toward environmentally friendly photolithographic materials: A new class of water-soluble photoresists Yamada S, Mrozek T, Rager T, Owens J, Rangel J, Willson CG, Byers J Macromolecules, 37(2), 377, 2004 |
4 |
Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system Somervell MH, Fryer DS, Osborn B, Patterson K, Byers J, Willson CG Journal of Vacuum Science & Technology B, 18(5), 2551, 2000 |
5 |
157 nm resist materials: Progress report Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, Willson CG Journal of Vacuum Science & Technology B, 18(6), 3396, 2000 |
6 |
Study of resolution limits due to intrinsic bias in chemically amplified photoresists Postnikov SV, Stewart MD, Tran HV, Nierode MA, Medeiros DR, Cao T, Byers J, Webber SE, Wilson CG Journal of Vacuum Science & Technology B, 17(6), 3335, 1999 |