화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Bateman in Nature: Predation on Offspring Reduces the Potential for Sexual Selection
Byers J, Dunn S
Science, 338(6108), 802, 2012
2 Non-natives: 141 scientists object
Simberloff D, Alexander J, Allendorf F, Aronson J, Antunes PM, Bacher S, Bardgett R, Bertolino S, Bishop M, Blackburn TM, Blakeslee A, Blumenthal D, Bortolus A, Buckley R, Buckley Y, Byers J, Callaway RM, Campbell F, Campbell K, Campbell M, Carlton JT, Cassey P, Catford J, Celesti-Grapow L, Chapman J, Clark P, Clewell A, Clode JC, Chang A, Chytry M, Clout M, Cohen A, Cowan P, Cowie RH, Crall AW, Crooks J, Deveney M, Dixon K, Dobbs FC, Duffy DC, Duncan R, Ehrlich PR, Eldredge L, Evenhuis N, Fausch KD, Feldhaar H, Firn J, Fowler A, Galil B, Garcia-Berthou E, Geller J, Genovesi P, Gerber E, Gherardi F, Gollasch S, Gordon D, Graham J, Gribben P, Griffen B, Grosholz ED, Hewitt C, Hierro JL, Hulme P, Hutchings P, Jarosik V, Jeschke JM, Johnson C, Johnson L, Johnston EL, Jones CG, Keller R, King CM, Knols BGJ, Kollmann J, Kompas T, Kotanen PM, Kowarik I, Kuhn I, Kumschick S, Leung B, Liebhold A, MacIsaac H, Mack R, McCullough DG, McDonald R, Merritt DM, Meyerson L, Minchin D, Mooney HA, Morisette JT, Moyle P, Heinz MS, Murray BR, Nehring S, Nelson W, Nentwig W, Novak SJ, Occhipinti A, Ojaveer H, Osborne B, Ostfeld RS, Parker J, Pederson J, Pergl J, Phillips ML, Pysek P, Rejmanek M, Ricciardi A, Ricotta C, Richardson D, Rilov G, Ritchie E, Robertson PA, Roman J, Ruiz G, Schaefer H, Schaffelke B, Schierenbeck KA, Schmitz DC, Schwindt E, Seeb J, Smith LD, Smith GF, Stohlgren T, Strayer DL, Strong D, Sutherland WJ, Therriault T, Thuiller W, Torchin M, van der Putten WH, Vila M, Von Holle B, Wallentinus I, Wardle D, Williamson M, Wilson J, Winter M, Wolfe LM, Wright J, Wonham M, Zabin C
Nature, 475(7354), 36, 2011
3 Toward environmentally friendly photolithographic materials: A new class of water-soluble photoresists
Yamada S, Mrozek T, Rager T, Owens J, Rangel J, Willson CG, Byers J
Macromolecules, 37(2), 377, 2004
4 Study of the fundamental contributions to line edge roughness in a 193 nm, top surface imaging system
Somervell MH, Fryer DS, Osborn B, Patterson K, Byers J, Willson CG
Journal of Vacuum Science & Technology B, 18(5), 2551, 2000
5 157 nm resist materials: Progress report
Brodsky C, Byers J, Conley W, Hung R, Yamada S, Patterson K, Somervell M, Trinque B, Tran HV, Cho S, Chiba T, Lin SH, Jamieson A, Johnson H, Vander Heyden T, Willson CG
Journal of Vacuum Science & Technology B, 18(6), 3396, 2000
6 Study of resolution limits due to intrinsic bias in chemically amplified photoresists
Postnikov SV, Stewart MD, Tran HV, Nierode MA, Medeiros DR, Cao T, Byers J, Webber SE, Wilson CG
Journal of Vacuum Science & Technology B, 17(6), 3335, 1999