| 1 |
Structural properties of hydrogenated microcrystalline silicon-carbon alloys deposited by Radio Frequency Plasma Enhanced Chemical Vapor Deposition: Effect of microcrystalline silicon seed layer and methane flow rate
Gaiaschi S, Ruggeri R, Johnson EV, Bulkin P, Chapon P, Gueunier-Farret ME, Mannino G, Longeaud C, Kleider JP
Thin Solid Films, 550, 312, 2014 |
| 2 |
Raman spectra of amorphous isotope-enriched 74Ge with low-strained Ge nanocrystals
Andreev BA, Gavrilenko LV, Drozdov YN, Yunin PA, Pryakhin DA, Mochalov LA, Sennikov PG, Bulkin P, Roca i Cabarrocas P
Thin Solid Films, 552, 46, 2014 |
| 3 |
Capillary jet injection of SiH4 in the high density plasma chemical vapor deposition of SiO2
Botha R, Novikova T, Bulkin P
Journal of Vacuum Science & Technology A, 27(4), 849, 2009 |
| 4 |
Silane injection in a high-density low-pressure plasma system and its influence on the deposition kinetics and material properties of SiO2
Botha R, Ibrahim BH, Bulkin P, Drevillon B
Journal of Vacuum Science & Technology A, 26(5), 1115, 2008 |
| 5 |
Advances in the deposition of microcrystalline silicon at high rate by distributed electron cyclotron resonance
Cabarrocas PRI, Bulkin P, Daineka D, Dao TH, Leempoel P, Descamps P, de Meerendre TK, Charliac J
Thin Solid Films, 516(20), 6834, 2008 |
| 6 |
Distributed electron cyclotron resonance plasma: A technology for large area deposition of device-quality a-Si : H at very high rate
Leempoel P, Descamps P, de Meerendre TK, Charliac J, Cabarrocas PRI, Bulkin P, Daineka D, Dao TH, Kleider JP, Gueunier-Farret ME, Longeaud C
Thin Solid Films, 516(20), 6853, 2008 |
| 7 |
Deposition of dielectrics using a matrix distributed electron cyclotron resonance plasma enhanced chemical vapor deposition system
Botha R, Ibrahim BH, Bulkin P, Drevillon B
Thin Solid Films, 515(19), 7594, 2007 |
| 8 |
Effect of thermal coupling on the electronic properties of hydrogenated amorphous silicon thin films deposited by electron cyclotron resonance
Dao TH, Gueunier-Farret ME, Daineka D, Bulkin P, Cabarrocas PRI, Kleider JP, Longeaud C, Bazin C, de Meerendre TK, Descamps P, Leempoel P
Thin Solid Films, 515(19), 7650, 2007 |
| 9 |
Simple method of gas flow ratio optimization in high rate deposition of SiO2 by electron cyclotron resonance plasma enhanced chemical vapor deposition
Daineka D, Bulkin P, Girard G, Drevillon B
Journal of Vacuum Science & Technology A, 22(1), 36, 2004 |
| 10 |
Deposition of SiO2 and SiO2 : Ge films for optical applications in a matrix distributed electron cyclotron resonance reactor
Daineka D, Bulkin P, Girard G, Bouree JE
Materials Science Forum, 455-456, 25, 2004 |
