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The effect of photon illumination in rapid thermal processing on the characteristics of MOS structures with ultra-thin oxides examined by substrate injection Huang CH, Hwu JG Solid-State Electronics, 49(10), 1599, 2005 |
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Sensitivity of contactless transient spectroscopy and actual measurement of localized states in oxidized Si wafer Yoshida H, Nakanishi R, Kishino S Journal of Crystal Growth, 210(1-3), 379, 2000 |
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A new voltage transient technique for deep-level studies in depletion-mode field-effect transistors Kolev P, Deen MH, Hardy T, Murowinski R Journal of the Electrochemical Society, 145(9), 3258, 1998 |