화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Impact of line edge roughness on copper interconnects
Leunissen LHA, Zhang W, Wu W, Brongersma SH
Journal of Vacuum Science & Technology B, 24(4), 1859, 2006
2 Impurity incorporation during copper electrodeposition in the curvature-enhanced accelerator coverage regime
Zhang W, Brongersma SH, Conard T, Wu W, Van Hove M, Vandervorst W, Maex K
Electrochemical and Solid State Letters, 8(7), C95, 2005
3 Geometry effect on impurity incorporation and grain growth in narrow copper lines
Zhang W, Brongersma SH, Heylen N, Beyer G, Vandervorst W, Maex K
Journal of the Electrochemical Society, 152(12), C832, 2005
4 Plasma modification of porous low-k dielectrics
Le QT, Whelan CM, Struyf H, Bender H, Conard T, Brongersma SH, Boullart W, Vanhaelemeersch S, Maex K
Electrochemical and Solid State Letters, 7(9), F49, 2004
5 Corrosion of narrow copper damascene interconnects
Ernur D, Terzieva V, Wu W, Brongersma SH, Maex K
Journal of the Electrochemical Society, 151(12), B636, 2004
6 Fabrication of 100 nm pitch copper interconnects by electron beam lithography
Wu W, Jonckheere R, Tokei Z, Brongersma SH, Van Hove M, Maez K
Journal of Vacuum Science & Technology B, 22(4), L11, 2004
7 Surface and grain boundary scattering studied in beveled polycrystalline thin copper films
Zhang W, Brongersma SH, Clarysse T, Terzieva V, Rosseel E, Vandervorst W, Maex K
Journal of Vacuum Science & Technology B, 22(4), 1830, 2004
8 Microstructure and resistivity characterization of CuAuI superlattice formed in Gu/Au thin films
Zhang W, Brongersma SH, Richard O, Brijs B, Palmans R, Froyen L, Maex K
Journal of Vacuum Science & Technology B, 22(6), 2715, 2004
9 Copper deposition and subsequent grain structure evolution in narrow lines
Brongersma SH, D'Haen J, Vanstreels K, DeCeuninck W, Vervoort I, Maex K
Materials Science Forum, 426-4, 2485, 2003
10 A quantitative adhesion study between contacting materials in Cu damascene structures
Lanckmans F, Brongersma SH, Varga I, Poortmans S, Bender H, Condard T, Maex K
Applied Surface Science, 201(1-4), 20, 2002