검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Photomask image enhancement using grating-generated surface waves Lafferty NV, Bourov A, Estroff A, Smith BW Journal of Vacuum Science & Technology B, 26(6), 2192, 2008 |
| 2 |
Hyper NA water immersion lithography at 193 nm and 248 nm Smith BW, Fan YF, Zhou JM, Bourov A, Zavyalova L, Lafferty N, Cropanese F, Estroff A Journal of Vacuum Science & Technology B, 22(6), 3439, 2004 |
| 3 |
Optical properties of thin film CrxNy-CrOxNy multilayer films for 157 nm optical lithography Rack PD, Lassiter M, Bourov A, Baiko D, Smith B Journal of Vacuum Science & Technology B, 21(2), 814, 2003 |
| 4 |
Plasma reactive ion etching of 193 nm attenuated phase shift mask materials Smith BW, Fonseca C, Zavyalova L, Alam Z, Bourov A Journal of Vacuum Science & Technology B, 15(6), 2259, 1997 |
| 5 |
Investigation into excimer laser radiation damage of deep ultraviolet optical phase masking films Smith BW, Zavyalova L, Bourov A, Butt S, Fonseca C Journal of Vacuum Science & Technology B, 15(6), 2444, 1997 |