검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Homo-heterojunction concept: From simulations to high efficiency solar cell It demonstration Carrere T, Lachaume R, Thai QM, Coig M, Kleider JP, Munoz D Solar Energy Materials and Solar Cells, 182, 178, 2018 |
| 2 |
Improvement of trench MOS barrier Schottky rectifier by using high-energy counter-doping trench-bottom implantation Juang MH, Yu J, Jang SL Current Applied Physics, 11(3), 698, 2011 |
| 3 |
Shallow boron dopant on silicon - An MD study Perez-Martin AMC, Jimenez-Rodriguez JJ, Jimenez-Saez JC Applied Surface Science, 234(1-4), 228, 2004 |
| 4 |
Reactive ion etching of Silicon Carbide with patterned Boron implantation Vassilevski K, Hedley J, Horsfall AB, Johnson CM, Wright NG Materials Science Forum, 457-460, 925, 2004 |
| 5 |
Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatment Chang TC, Mor YS, Liu PT, Tsai TM, Chen CW, Sze SM, Mei YJ Thin Solid Films, 398-399, 637, 2001 |
| 6 |
Modeling of Damage Accumulation During Ion-Implantation into Single-Crystalline Silicon Posselt M, Schmidt B, Murthy CS, Feudel T, Suzuki K Journal of the Electrochemical Society, 144(4), 1495, 1997 |