검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Millisecond microwave annealing: Driving microelectronics nano Thompson K, Booske JH, Ives RL, Lohr J, Gorelov Y, Kajiwara K Journal of Vacuum Science & Technology B, 23(3), 970, 2005 |
| 2 |
Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition (vol A16, pg 2198, 1998) Foster JE, Wendt AE, Wang WW, Booske JH Journal of Vacuum Science & Technology A, 17(1), 322, 1999 |
| 3 |
Measurement of electron energy distribution function in an argon copper plasma for ionized physical vapor deposition Lu ZC, Foster JE, Snodgrass TG, Booske JH, Wendt AE Journal of Vacuum Science & Technology A, 17(3), 840, 1999 |
| 4 |
Determination of metal vapor ion concentration in an argon/copper plasma for ionized physical vapor deposition Foster JE, Wendt AE, Wang WW, Booske JH Journal of Vacuum Science & Technology A, 16(4), 2198, 1998 |
| 5 |
Recoil implantation of boron into silicon for ultrashallow junction formation : Modeling, fabrication, and characterization Liu HL, Gearhart SS, Booske JH, Wang W Journal of Vacuum Science & Technology B, 16(1), 415, 1998 |
| 6 |
X-Ray-Imaging During Plasma-Source Ion-Implantation Piper M, Shohet JL, Booske JH, Chew KH, Zhang L, Sandstrom P, Jacobs J Plasma Chemistry and Plasma Processing, 16(1), 141, 1996 |
| 7 |
Plasma-Immersed Oxygen-Ion Implantation of Iron-Doped Glass for Nonmetallic Magnetic Hard Disks Zhang L, Booske JH, Cooper RF, Shohet JL, Jacobs JR, Anderson FS, Goeckner MJ, Wicksberg EB, Was G Journal of Vacuum Science & Technology B, 12(6), 3342, 1994 |