화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Electrical properties of cobalt and copper contamination in processed silicon
Benton JL, Boone T, Jacobson DC, Silverman PJ, Rosamilia JM, Rafferty CS, Weinzierl S, Vu B
Journal of the Electrochemical Society, 148(6), G326, 2001
2 Behavior of molybdenum in silicon evaluated for integrated circuit processing
Benton JL, Jacobson DC, Jackson B, Johnson JA, Boone T, Eaglesham DJ, Stevie FA, Becerro J
Journal of the Electrochemical Society, 146(5), 1929, 1999
3 Gate technology for 70 nm metal-oxide-semiconductor field-effect transistors with ultrathin (< 2 nm) oxides
Tennant D, Klemens F, Sorsch T, Baumann F, Timp G, Layadi N, Kornblit A, Sapjeta BJ, Rosamilia J, Boone T, Weir B, Silverman P
Journal of Vacuum Science & Technology B, 15(6), 2799, 1997
4 On Raising Energy-Expenditure in OB/OB Mice - Response
Pelleymounter MA, Cullen MJ, Baker MB, Hecht R, Winters D, Boone T, Collins F
Science, 276(5315), 1132, 1997
5 Effects of the Obese Gene-Product on Body-Weight Regulation in OB/OB Mice
Pelleymounter MA, Cullen MJ, Baker MB, Hecht R, Winters D, Boone T, Collins F
Science, 269(5223), 540, 1995
6 Comparison of Advanced Plasma Sources for Etching Applications .4. Plasma-Induced Damage in a Helicon and a Multipole Electron-Cyclotron-Resonance Source
Blayo N, Tepermeister I, Benton JL, Higashi GS, Boone T, Onuoha A, Klemens FP, Ibbotson DE, Sawin HH
Journal of Vacuum Science & Technology B, 12(3), 1340, 1994