화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Time-resolved cavity ring-down spectroscopic study of the gas phase and surface loss rates of Si and SiH3 plasma radicals
Hoefnagels JPM, Stevens AAE, Boogaarts MGH, Kessels WMM, van de Sanden MCM
Chemical Physics Letters, 360(1-2), 189, 2002
2 Cavity ring down detection of SiH3 in a remote SiH4 plasma and comparison with model calculations and mass spectrometry
Kessels WMM, Leroux A, Boogaarts MGH, Hoefnagels JPM, van de Sanden MCM, Schram DC
Journal of Vacuum Science & Technology A, 19(2), 467, 2001
3 Improvement of hydrogenated amorphous silicon properties with increasing contribution of SiH3 to film growth
Kessels WMM, Boogaarts MGH, Hoefnagels JPM, Schram DC, van de Sanden MCM
Journal of Vacuum Science & Technology A, 19(3), 1027, 2001
4 Cavity ring down detection of SiH3 on the broadband (A)over-tilde (2)A'(1) <- (X)over-tilde (2)A(1) transition in a remote Ar-H-2-SiH4 plasma
Boogaarts MGH, Bocker PJ, Kessels WMM, Schram DC, van de Sanden MCM
Chemical Physics Letters, 326(5-6), 400, 2000