화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Combined spectroscopic ellipsometry and attenuated total reflection analyses of Al2O3/HfO2 nanolaminates
Bonvalot M, Kahn M, Vallee C, Gourvest E, Abed H, Jorel C, Dubourdieu C
Thin Solid Films, 518(18), 5057, 2010
2 Physicochemical and electrical characterizations of atomic layer deposition grown HfO2 on TiN and Pt for metal-insulator-metal application
Jorel C, Vallee C, Gourvest E, Pelissier B, Kahn M, Bonvalot M, Gonon P
Journal of Vacuum Science & Technology B, 27(1), 378, 2009
3 Structural and electrical characterizations of yttrium oxide films after postannealing treatments (vol 152, 217, 2005)
Durand C, Dubourdieu C, Vallee C, Gautier E, Ducroquet F, Jalabert D, Roussel H, Bonvalot M, Joubert O
Journal of the Electrochemical Society, 153(2), L4, 2006
4 Structural and electrical characterizations of yttrium oxide films after postannealing treatments
Durand C, Dubourdieu C, Vallee C, Gautier E, Ducroquet F, Jalabert D, Roussel H, Bonvalot M, Joubert O
Journal of the Electrochemical Society, 152(12), F217, 2005
5 Metal-insulator-metal capacitors using Y2O3 dielectric grown by pulsed-injection plasma enhanced metalorganic chemical vapor deposition
Durand C, Vallee C, Loup V, Salicio O, Dubourdieu C, Blonkowski S, Bonvalot M, Holliger P, Joubert O
Journal of Vacuum Science & Technology A, 22(3), 655, 2004
6 Interface formation during the yttrium oxide deposition on Si by pulsed liquid-injection plasma enhanced metal-organic chemical vapor deposition
Durand C, Vallee C, Dubourdieu C, Gautier E, Bonvalot M, Joubert O
Journal of Vacuum Science & Technology A, 22(6), 2490, 2004
7 High density plasma etching of low k dielectric polymers in oxygen-based chemistries
Fuard D, Joubert O, Vallier L, Bonvalot M
Journal of Vacuum Science & Technology B, 19(2), 447, 2001