화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Step Coverage Comparison of Ti/Tin Deposited by Collimated and Uncollimated Physical Vapor-Deposition Techniques
Wang SQ, Schlueter J, Gondran C, Boden T
Journal of Vacuum Science & Technology B, 14(3), 1846, 1996
2 Silicon-on-Insulator Material Qualification for Low-Power Complementary Metal-Oxide-Semiconductor Application
Mendicino MA, Vasudev PK, Maillot P, Hoener C, Baylis J, Bennett J, Boden T, Jackett S, Huffman K, Godwin M
Thin Solid Films, 270(1-2), 578, 1995