화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Influence of plasma composition on reflectance anisotropy spectra for in situ III-V semiconductor dry-etch monitoring
Barzen L, Kleinschmidt AK, Strassner J, Doering C, Fouckhardt H, Bock W, Wahl M, Kopnarski M
Applied Surface Science, 357, 530, 2015
2 Polymer Field-Effect Transistors Fabricated by the Sequential Gravure Printing of Polythiophene, Two Insulator Layers, and a Metal Ink Gate
Voigt MM, Guite A, Chung DY, Khan RUA, Campbell AJ, Bradley DDC, Meng FS, Steinke JHG, Tierney S, McCulloch I, Penxten H, Lutsen L, Douheret O, Manca J, Brokmann U, Sonnichsen K, Hulsenberg D, Bock W, Barron C, Blanckaert N, Springer S, Grupp J, Mosley A
Advanced Functional Materials, 20(2), 239, 2010
3 Investigation of silicon contamination of Ta filaments used for thin film silicon deposition
Grunski D, Schroeder B, Scheib M, Merz RM, Bock W, Wagner C
Thin Solid Films, 516(5), 818, 2008
4 TOF-SIMS study of photocatalytic decomposition reactions on nanocrystalline TiO2
Gnaser H, Orendorz A, Ziegler C, Rowlett E, Bock W
Applied Surface Science, 252(19), 6996, 2006
5 Hot-wire chemical-vapor-deposited nanometer range a-SiC : H diffusion barrier films for ultralarge-scale-integrated application
Singh SK, Kumbhar AA, Dusane RO, Bock W
Journal of Vacuum Science & Technology B, 24(2), 543, 2006
6 A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films
Kothleitner G, Rogers M, Berendes A, Bock W, Kolbesen BO
Applied Surface Science, 252(1), 66, 2005
7 Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(100) wafers - preparation of oxynitride films
Brunkahl O, Bock W, Thoma K, Kolbesen BO
Applied Surface Science, 252(1), 177, 2005
8 Formation of niobium oxynitrides by rapid thermal processing (RTP)
Matylitskaya VA, Bock W, Thoma K, Kolbesen BO
Applied Surface Science, 252(1), 205, 2005
9 Structure and composition of 3C-SiC : Ge alloys grown on Si (111) substrates by SSMBE
Weih P, Cimalla V, Stauden T, Kosiba R, Spiess L, Romanus H, Gubisch M, Bock W, Freitag T, Fricke P, Ambacher O, Pezoldt J
Materials Science Forum, 457-460, 293, 2004
10 Formation of tantalum nitride films by rapid thermal processing
Angelkort C, Berendes A, Lewalter H, Bock W, Kolbesen BO
Thin Solid Films, 437(1-2), 108, 2003