검색결과 : 13건
No. | Article |
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1 |
Influence of plasma composition on reflectance anisotropy spectra for in situ III-V semiconductor dry-etch monitoring Barzen L, Kleinschmidt AK, Strassner J, Doering C, Fouckhardt H, Bock W, Wahl M, Kopnarski M Applied Surface Science, 357, 530, 2015 |
2 |
Polymer Field-Effect Transistors Fabricated by the Sequential Gravure Printing of Polythiophene, Two Insulator Layers, and a Metal Ink Gate Voigt MM, Guite A, Chung DY, Khan RUA, Campbell AJ, Bradley DDC, Meng FS, Steinke JHG, Tierney S, McCulloch I, Penxten H, Lutsen L, Douheret O, Manca J, Brokmann U, Sonnichsen K, Hulsenberg D, Bock W, Barron C, Blanckaert N, Springer S, Grupp J, Mosley A Advanced Functional Materials, 20(2), 239, 2010 |
3 |
Investigation of silicon contamination of Ta filaments used for thin film silicon deposition Grunski D, Schroeder B, Scheib M, Merz RM, Bock W, Wagner C Thin Solid Films, 516(5), 818, 2008 |
4 |
TOF-SIMS study of photocatalytic decomposition reactions on nanocrystalline TiO2 Gnaser H, Orendorz A, Ziegler C, Rowlett E, Bock W Applied Surface Science, 252(19), 6996, 2006 |
5 |
Hot-wire chemical-vapor-deposited nanometer range a-SiC : H diffusion barrier films for ultralarge-scale-integrated application Singh SK, Kumbhar AA, Dusane RO, Bock W Journal of Vacuum Science & Technology B, 24(2), 543, 2006 |
6 |
A combined SNMS and EFTEM/EELS study on focused ion beam prepared vanadium nitride thin films Kothleitner G, Rogers M, Berendes A, Bock W, Kolbesen BO Applied Surface Science, 252(1), 66, 2005 |
7 |
Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(100) wafers - preparation of oxynitride films Brunkahl O, Bock W, Thoma K, Kolbesen BO Applied Surface Science, 252(1), 177, 2005 |
8 |
Formation of niobium oxynitrides by rapid thermal processing (RTP) Matylitskaya VA, Bock W, Thoma K, Kolbesen BO Applied Surface Science, 252(1), 205, 2005 |
9 |
Structure and composition of 3C-SiC : Ge alloys grown on Si (111) substrates by SSMBE Weih P, Cimalla V, Stauden T, Kosiba R, Spiess L, Romanus H, Gubisch M, Bock W, Freitag T, Fricke P, Ambacher O, Pezoldt J Materials Science Forum, 457-460, 293, 2004 |
10 |
Formation of tantalum nitride films by rapid thermal processing Angelkort C, Berendes A, Lewalter H, Bock W, Kolbesen BO Thin Solid Films, 437(1-2), 108, 2003 |