검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Plasma etching of Hf-based high-k thin films. Part II. Ion-enhanced surface reaction mechanisms Martin RM, Blom HO, Chang JP Journal of Vacuum Science & Technology A, 27(2), 217, 2009 |
| 2 |
Generation of Oxide Nanopatterns by Combining Self-Assembly of S-Layer Proteins and Area-Selective Atomic Layer Deposition Liu JR, Mao YB, Lan E, Banatao DR, Forse GJ, Lu J, Blom HO, Yeates TO, Dunn B, Chang JP Journal of the American Chemical Society, 130(50), 16908, 2008 |
| 3 |
Investigation of fabrication uniformity and emission reliability of silicon field emitters for use in space Wang L, Aplin KL, Huq SE, Kent BJ, Stevens R, Malik A, Blom HO, Loader IM, Thomas GR Journal of Vacuum Science & Technology B, 24(2), 1072, 2006 |
| 4 |
Simulation and dielectric characterization of reactive dc magnetron cosputtered (Ta2O5)(1-x)(TiO2)(x) thin films Westlinder J, Zhang Y, Engelmark F, Possnert G, Blom HO, Olsson J, Berg S Journal of Vacuum Science & Technology B, 20(3), 855, 2002 |
| 5 |
Patterning of tantalum pentoxide, a high epsilon material, by inductively coupled plasma etching Jonsson LB, Westlinder J, Engelmark F, Hedlund C, Du J, Smith U, Blom HO Journal of Vacuum Science & Technology B, 18(4), 1906, 2000 |
| 6 |
Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process Berg S, Nyberg T, Blom HO, Nender C Journal of Vacuum Science & Technology A, 16(3), 1277, 1998 |
| 7 |
Selective SiO2-to-Si3N4 etching in inductively coupled fluorocarbon plasmas : Angular dependence of SiO2 and Si3N4 etching rates Schaepkens M, Oehrlein GS, Hedlund C, Jonsson LB, Blom HO Journal of Vacuum Science & Technology A, 16(6), 3281, 1998 |
| 8 |
Angular-Dependence of the Polysilicon Etch Rate During Dry-Etching in SF6 and Cl-2 Hedlund C, Jonsson LB, Katardjiev IV, Berg S, Blom HO Journal of Vacuum Science & Technology A, 15(3), 686, 1997 |
| 9 |
Discharge Disruptions in a Helicon Plasma Source Shamrai KP, Virko VF, Blom HO, Pavlenko VP, Taranov VB, Jonsson LB, Hedlund C, Berg S Journal of Vacuum Science & Technology A, 15(6), 2864, 1997 |
| 10 |
Method for the Determination of the Angular-Dependence During Dry-Etching Hedlund C, Strandman C, Katardjiev IV, Backlund Y, Berg S, Blom HO Journal of Vacuum Science & Technology B, 14(5), 3239, 1996 |