검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system Liddle JA, Blakey MI, Bolan K, Farrow RC, Gallatin GM, Kasica R, Katsap V, Knurek CS, Li J, Mkrtchyan M, Novembre AE, Ocola L, Orphanos PA, Peabody ML, Stanton ST, Teffeau K, Waskiewicz WK, Munro E Journal of Vacuum Science & Technology B, 19(2), 476, 2001 |
| 2 |
Pattern placement correction methodology for 200 mm SCALPEL masks Ocola LE, Farrow RC, Kasica RJ, Caminos CG, Rutberg L, Fullowan RF, Teffeau K, Blakey MI, Peabody ML, Knurek CS, Bogart GR, Novembre AE, Liddle JA, Lercel M, Magg C, Collins K, Trybendis M, Cadwell N, Jeffer R, Dauksher WJ, Resnick DJ, Mancini D, Han SI, Masnyj Z, Smith K, Mangat PJS Journal of Vacuum Science & Technology B, 19(6), 2659, 2001 |
| 3 |
Metrology of scattering with angular limitation projection electron lithography masks Liddle JA, Blakey MI, Saunders T, Farrow RC, Fetter LA, Knurek CS, Kasica R, Novembre AE, Peabody ML, Tennant DM, Windt DL, Postek M Journal of Vacuum Science & Technology B, 15(6), 2197, 1997 |
| 4 |
Preliminary-Results from a Prototype Projection Electron-Beam Stepper-Scattering with Angular Limitation Projection Electron-Beam Lithography Proof-of-Concept System Harriott LR, Berger SD, Biddick C, Blakey MI, Bowler SW, Brady K, Camarda RM, Connelly WF, Crorken A, Custy J, Dimarco R, Farrow RC, Felker JA, Fetter L, Freeman R, Hopkins L, Huggins HA, Knurek CS, Kraus JS, Liddle JA, Mkrtychan M, Novembre AE, Peabody ML, Tarascon RG, Wade HH, Waskiewicz WK, Watson GP, Werder KS, Windt D Journal of Vacuum Science & Technology B, 14(6), 3825, 1996 |
| 5 |
Precise Measurement of the Effective Backscatter Coefficient for 100-keV Electron-Beam Lithography on Si Watson GP, Berger SD, Liddle JA, Fetter LA, Farrow RC, Tarascon RG, Mkrtchyan M, Novembre AE, Blakey MI, Bolan KJ, Poli L Journal of Vacuum Science & Technology B, 13(6), 2535, 1995 |