화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Study of Ion Mixing During Auger Depth Profiling of Ge-Si Multilayer System .2. Low Ion Energy (0.2-2 keV) Range
Menyhard M, Barna A, Biersack JP, Jarrendahl K, Sundgren JE
Journal of Vacuum Science & Technology A, 13(4), 1999, 1995
2 Study of Ion Mixing During Auger-Electron Spectroscopy Death Profiling of Ge-Si Multilayer System
Menyhard M, Barna A, Biersack JP
Journal of Vacuum Science & Technology A, 12(4), 2368, 1994