검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Thin films of HfO2 for high-k gate oxide applications from engineered alkoxide- and amide-based MOCVD precursors Thomas R, Rije E, Ehrhart P, Milanov A, Bhakta R, Bauneman A, Devi A, Fischer R, Waser R Journal of the Electrochemical Society, 154(3), G77, 2007 |
| 2 |
Guanidinate-stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2 Milanov A, Bhakta R, Baunemann A, Becker HW, Thomas R, Ehrhart P, Winter M, Devi A Inorganic Chemistry, 45(26), 11008, 2006 |