화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 The Atomic-Level Structure of Cementitious Calcium Aluminate Silicate Hydrate
Mohamed AK, Moutzouri P, Berruyer P, Walder BJ, Siramanont J, Harris M, Negroni M, Galmarini SC, Parker SC, Scrivener KL, Emsley L, Bowen P
Journal of the American Chemical Society, 142(25), 11060, 2020
2 Metal-Metal Synergy in Well-Defined Surface Tantalum-Iridium Heterobimetallic Catalysts for H/D Exchange Reactions
Lassalle S, Jabbour R, Schiltz P, Berruyer P, Todorova TK, Veyre L, Gajan D, Lesage A, Thieuleux C, Camp C
Journal of the American Chemical Society, 141(49), 19321, 2019
3 Three-Dimensional Structure Determination of Surface Sites
Berruyer P, Lelli M, Conley MP, Silverio DL, Widdifield CM, Siddiqi G, Gajan D, Lesage A, Coperet C, Emsley L
Journal of the American Chemical Society, 139(2), 849, 2017
4 Dynamic Nuclear Polarization Efficiency Increased by Very Fast Magic Angle Spinning
Chaudhari SR, Wisser D, Pinon AC, Berruyer P, Gajan D, Tordo P, Ouari O, Reiter C, Engelke F, Coperet C, Lelli M, Lesage A, Emsley L
Journal of the American Chemical Society, 139(31), 10609, 2017
5 Etch mechanisms of low dielectric constant polymers in high density plasmas: Impact of charging effects on profile distortion during the etching process
Fuard D, Joubert O, Vallier L, Assous M, Berruyer P, Blanc R
Journal of Vacuum Science & Technology B, 19(6), 2223, 2001
6 Dielectric etching for 0.18 mu m technologies
Berruyer P, Vinet F, Feldis H, Blanc R, Lerme M, Morand Y, Poiroux T
Journal of Vacuum Science & Technology A, 16(3), 1604, 1998
7 Analyses of the Chemical Topography of Silicon Dioxide Contact Holes Etched in a High-Density Plasma Source
Joubert O, Czuprynski P, Bell FH, Berruyer P, Blanc R
Journal of Vacuum Science & Technology B, 15(3), 629, 1997