검색결과 : 1건
No. | Article |
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1 |
Plasma-assisted atomic layer deposition of conductive hafnium nitride using tetrakis(ethylmethylamino)hafnium for CMOS gate electrode applications Consiglio S, Zeng WX, Berliner N, Eisenbraun ET Journal of the Electrochemical Society, 155(3), H196, 2008 |