화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Quantitative depth profiling of Si1-xGex structures by time-of-flight secondary ion mass spectrometry and secondary neutral mass spectrometry
Drozdov MN, Drozdov YN, Csik A, Novikov AV, Vad K, Yunin PA, Yurasov DV, Belykh SF, Gololobov GP, Suvorov DV, Tolstogouzov A
Thin Solid Films, 607, 25, 2016
2 Caesium sputter ion source compatible with commercial SIMS instruments
Belykh SF, Palitsin V, Veryovkin IV, Kovarsky AP, Chang RJH, Adriaens A, Dowsett M, Adams F
Applied Surface Science, 252(19), 7321, 2006
3 On the trends in kinetic energies of secondary ions produced by polyatomic ion bombardment
Veryovkin IV, Belykh SF, Adriaens A, Zinovev AV, Adams F
Applied Surface Science, 231-2, 101, 2004
4 Features of non-additive sputtering for various "molecular projectile-solid" systems
Belykh SF, Kovarsky AP, Palitsin VV, Adriaens A, Adams F
Applied Surface Science, 203, 122, 2003
5 Effect of the projectile parameters on the charge state formation process in solid sputtering
Belykh SF, Palitsin VV, Adriaens A, Adams F
Applied Surface Science, 203, 126, 2003