화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
Bruce RL, Lin T, Phaneuf RJ, Oehrlein GS, Bell W, Long B, Willson CG
Journal of Vacuum Science & Technology B, 28(4), 751, 2010
2 A chemical assessment of the suitability of allyl-iso-propyltelluride as a Te precursor for metal organic vapour phase epitaxy
Hails JE, Cole-Hamilton DJ, Stevenson J, Bell W, Foster DF, Ellis D
Journal of Crystal Growth, 224(1-2), 21, 2001
3 Allyl-iso-propyltelluride, a new MOVPE precursor for CdTe, HgTe and (Hg,Cd)Te
Hails JE, Cole-Hamilton DJ, Stevenson J, Bell W
Journal of Crystal Growth, 214, 45, 2000
4 Measurement of residual stresses in a multi-pass low alloy ferritic steel weld using X-ray diffraction
McDonald EJ, Exworthy LF, Flewitt PEJ, Hallam K, Bell W
Materials Science Forum, 347-3, 664, 2000