검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Reactive-environment, hollow cathode sputtering: Basic characteristics and application to Al2O3, doped ZnO, and In2O3 : MO Delahoy AE, Guo SY, Paduraru C, Belkind A Journal of Vacuum Science & Technology A, 22(4), 1697, 2004 |
| 2 |
Using pulsed direct current power for reactive sputtering of AL(2)O(3) Belkind A, Freillich A, Scholl R Journal of Vacuum Science & Technology A, 17(4), 1934, 1999 |
| 3 |
Enhancement of Reactive Sputtering Rate of TiO2 Using a Planar and Dual Rotatable Cylindrical Magnetrons Belkind A, Wolfe J Thin Solid Films, 248(2), 165, 1994 |