화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Calculation of 2-Center Integrals Involving a Rapidly Oscillating Free-Electron Wave-Function
Opdebeek SS, Driessen JP, Beijerinck HC, Verhaar BJ
Journal of Chemical Physics, 106(1), 182, 1997
2 Ion-Assisted Si/Xef2-Etching - Influence of Ion/Neutral Flux Ratio and Ion Energy
Vugts MJ, Hermans LJ, Beijerinck HC
Journal of Vacuum Science & Technology A, 14(4), 2138, 1996
3 Si/Xef2 Etching - Temperature-Dependence
Vugts MJ, Verschueren GL, Eurlings MF, Hermans LJ, Beijerinck HC
Journal of Vacuum Science & Technology A, 14(5), 2766, 1996
4 Si/Xef2 Etching - Reaction Layer Dynamics and Surface Roughening
Vugts MJ, Eurlings MF, Hermans LJ, Beijerinck HC
Journal of Vacuum Science & Technology A, 14(5), 2780, 1996
5 Ion-Assisted Si/Xef2 Etching - Temperature-Dependence in the Range 100-1000 K
Vugts MJ, Hermans LJ, Beijerinck HC
Journal of Vacuum Science & Technology A, 14(5), 2820, 1996
6 Dynamics of Ion-Assisted Etching in the Si(100)/Xef2/Ar+ System on a Time-Scale 100-Mu-S-1000-S
Joosten GJ, Vugts MJ, Spruijt HJ, Senhorst HA, Beijerinck HC
Journal of Vacuum Science & Technology A, 12(3), 636, 1994
7 Spontaneous Etching of Si(100) by Xef2 - Test-Case for a New Beam Surface Experiment
Vugts MJ, Joosten GJ, Vanoosterum A, Senhorst HA, Beijerinck HC
Journal of Vacuum Science & Technology A, 12(6), 2999, 1994