검색결과 : 10건
No. | Article |
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1 |
Magnesium K-Edge NEXAFS Spectroscopy of Chlorophyll alpha in Solution Witte K, Streeck C, Mantouvalou J, Suchkova SA, Lokstein H, Grotzsch D, Martyanov W, Weser J, Kanngiesser B, Beckhoff B, Stiel H Journal of Physical Chemistry B, 120(45), 11619, 2016 |
2 |
Ion beam analysis of Cu(In,Ga)Se-2 thin film solar cells Karydas AG, Streeck C, Radovic IB, Kaufmann C, Rissom T, Beckhoff B, Jaksic M, Barradas NP Applied Surface Science, 356, 631, 2015 |
3 |
Approaches to calculate the dielectric function of ZnO around the band gap Agocs E, Fodor B, Pollakowski B, Beckhoff B, Nutsch A, Jank M, Petrik P Thin Solid Films, 571, 684, 2014 |
4 |
Silicon carbonitride nanolayers - Synthesis and chemical characterization Hoffmann PS, Fainer NI, Baake O, Kosinova ML, Rumyantsev YM, Trunova VA, Klein A, Pollakowski B, Beckhoff B, Ensinger W Thin Solid Films, 520(18), 5906, 2012 |
5 |
Towards Passivation of Ge(100) Surfaces by Sulfur Adsorption from a (NH4)(2)S Solution: A Combined NEXAFS, STM and LEED Study Fleischmann C, Sioncke S, Couet S, Schouteden K, Beckhoff B, Muller M, Honicke P, Kolbe M, Van Haesendonck C, Meuris M, Temst K, Vantomme A Journal of the Electrochemical Society, 158(5), H589, 2011 |
6 |
Atomic Layer Deposition of High-kappa Dielectrics on Sulphur-Passivated Germanium Sioncke S, Lin HC, Brammertz G, Delabie A, Conard T, Franquet A, Meuris M, Struyf H, De Gendt S, Heyns M, Fleischmann C, Temst K, Vantomme A, Muller M, Kolbe M, Beckhoff B, Caymax M Journal of the Electrochemical Society, 158(7), H687, 2011 |
7 |
Self-Affine Surface Roughness of Chemically and Thermally Cleaned Ge(100) Surfaces Fleischmann C, Houssa M, Sioncke S, Beckhoff B, Muller M, Honicke P, Meuris M, Temst K, Vantomme A Journal of the Electrochemical Society, 158(10), H1090, 2011 |
8 |
Grazing incidence x-ray fluorescence and secondary ion mass spectrometry combined approach for the characterization of ultrashallow arsenic distribution in silicon Pepponi G, Giubertoni D, Bersani M, Meirer F, Ingerle D, Steinhauser G, Streli C, Hoenicke P, Beckhoff B Journal of Vacuum Science & Technology B, 28(1), C1C59, 2010 |
9 |
Ultralow energy boron implants in silicon characterization by nonoxidizing secondary ion mass spectrometry analysis and soft x-ray grazing incidence x-ray fluorescence techniques Giubertoni D, Iacob E, Hoenicke P, Beckhoff B, Pepponi G, Gennaro S, Bersani M Journal of Vacuum Science & Technology B, 28(1), C1C84, 2010 |
10 |
Comparison of reference-free X-ray fluorescence analysis and X-ray reflectometry for thickness determination in the nanometer range Kolbe M, Beckhoff B, Krumrey M, Ulm G Applied Surface Science, 252(1), 49, 2005 |