화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Dry-Etching Damage in III-V Semiconductors
Murad S, Rahman M, Johnson N, Thoms S, Beaumont SP, Wilkinson CD
Journal of Vacuum Science & Technology B, 14(6), 3658, 1996
2 Effects of O-2 Addition to Sicl4/Sif4 and the Thickness of the Capping Layer on Gate Recess Etching of GaAs-Pseudomorphic High-Electron-Mobility Transistors
Murad SK, Cameron NI, Beaumont SP, Wilkinson CD
Journal of Vacuum Science & Technology B, 14(6), 3668, 1996
3 Reliable Fabrication of Sub-40 nm Period Gratings Using a Nanolithography System with Interferometric Dynamic Focus Control
Cumming DR, Thomas S, Beaumont SP, Weaver JM
Journal of Vacuum Science & Technology B, 14(6), 4115, 1996
4 Selective Reactive Ion Etching of InGaAs and InP over InAlAs in Sicl4/Sif4/HBr Plasmas
Murad SK, Beaumont SP, Holland M, Wilkinson CD
Journal of Vacuum Science & Technology B, 13(6), 2344, 1995
5 Selectively Dry Gate Recessed GaAs Metal-Semiconductor Field-Effect Transistors, High-Electron-Mobility Transistors, and Monolithic Microwave Integrated-Circuits
Cameron NI, Ferguson S, Taylor MR, Beaumont SP, Holland M, Tronche C, Soulard M, Ladbrooke PH
Journal of Vacuum Science & Technology B, 11(6), 2244, 1993