검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic Naulleau P, Goldberg KA, Anderson EH, Attwood D, Batson P, Bokor J, Denham P, Gullikson E, Harteneck B, Hoef B, Jackson K, Olynick D, Rekawa S, Salmassi F, Blaedel K, Chapman H, Hale L, Mirkarimi P, Soufli R, Spiller E, Sweeney D, Taylor J, Walton C, O'Connell D, Tichenor D, Gwyn CW, Yan PY, Zhang GJ Journal of Vacuum Science & Technology B, 20(6), 2829, 2002 |
| 2 |
At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic Naulleau P, Goldberg KA, Anderson EH, Batson P, Denham PE, Jackson KH, Gullikson EM, Rekawa S, Bokor J Journal of Vacuum Science & Technology B, 19(6), 2396, 2001 |
| 3 |
Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system Goldberg KA, Naulleau P, Batson P, Denham P, Anderson EH, Chapman H, Bokor J Journal of Vacuum Science & Technology B, 18(6), 2911, 2000 |
| 4 |
At-wavelength detection of extreme ultraviolet lithography mask blank defects Jeong ST, Idir M, Lin Y, Johnson L, Rekawa S, Jones M, Denham P, Batson P, Levesque R, Kearney P, Yan PY, Gullikson E, Underwood JH, Bokor J Journal of Vacuum Science & Technology B, 16(6), 3430, 1998 |