검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Replacement fin processing for III-V on Si: From FinFets to nanowires Waldron N, Merckling C, Teugels L, Ong P, Sebaai F, Barla K, Collaert N, Thean VY Solid-State Electronics, 115, 81, 2016 |
| 2 |
Self-aligned double patterning process for subtractive Ge fin fabrication at 45-nm pitch Milenin AP, Witters L, Barla K, Thean A Thin Solid Films, 602, 64, 2016 |