검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Growth of patterned nanopore arrays of anodic aluminum oxide Yan JC, Rao GVR, Barela M, Brevnov DA, Jiang YB, Xu HF, Lopez GP, Atanassov PB Advanced Materials, 15(23), 2015, 2003 |
| 2 |
Effects of Ar and O-2 additives on SiO2 etching in C4F8-based plasmas Li X, Ling L, Hua XF, Fukasawa M, Oehrlein GS, Barela M, Anderson HM Journal of Vacuum Science & Technology A, 21(1), 284, 2003 |
| 3 |
Fluorocarbon-based plasma etching of SiO2: Comparison of C4F6/Ar and C4F8/Ar discharges Li X, Hua XF, Ling L, Oehrlein GS, Barela M, Anderson HM Journal of Vacuum Science & Technology A, 20(6), 2052, 2002 |
| 4 |
Oxide etch behavior in a high-density, low-pressure, inductively coupled C2F6 plasma: Etch rates, selectivity to photoresist, plasma parameters, and CFx radical densities Perry WL, Waters K, Barela M, Anderson HM Journal of Vacuum Science & Technology A, 19(5), 2272, 2001 |