검색결과 : 2건
No. | Article |
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1 |
Simulations of radical and ion fluxes on a wafer in a Cl-2/Ar inductively coupled plasma discharge: Confrontation with GaAs and GaN etch experiments Despiau-Pujo E, Chabert P, Bansropun S, Thenot D, Plouhinec P, Cassette S Journal of Vacuum Science & Technology B, 28(4), 693, 2010 |
2 |
Optimization of an inductively coupled plasma etching process of GalnP/GaAs based material for photonic band gap applications Combrie S, Bansropun S, Lecomte M, Parillaud O, Cassette S, Benisty H, Nagle J Journal of Vacuum Science & Technology B, 23(4), 1521, 2005 |