화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Sn etching with hydrogen radicals to clean EUV optics
van Herpen MMJW, Klunder DJW, Soer WA, Moors R, Banine V
Chemical Physics Letters, 484(4-6), 197, 2010
2 Particle Cleaning of EUV Reticles
Scaccabarozzi L, Lammers NA, Moors R, Banine V
Journal of Adhesion Science and Technology, 23(12), 1603, 2009
3 Extreme ultraviolet lithography: Status and prospects
Benschop J, Banine V, Lok S, Loopstra E
Journal of Vacuum Science & Technology B, 26(6), 2204, 2008