| 1 |
Sulfur as a Novel Nanopatterning Material: An Ultrathin Resist and a Chemically Addressable Template for Nanocrystal Self-Assembly
Germain J, Rolandi M, Backer SA, Frechet JMJ
Advanced Materials, 20(23), 4526, 2008 |
| 2 |
High-field scanning probe lithography in hexadecane: Transitioning from field induced oxidation to solvent decomposition through surface modification
Suez I, Rolandi M, Backer SA, Scholl A, Doran A, Okawa D, Zettl A, Frechet JMJ
Advanced Materials, 19(21), 3570, 2007 |
| 3 |
Fabrication of magnetic force microscopy probes via localized electrochemical deposition of cobalt
Rolandi M, Okawa D, Backer SA, Zettl A, Frechet JMJ
Journal of Vacuum Science & Technology B, 25(5), L39, 2007 |
| 4 |
Evaluation of new materials for plasmonic imaging lithography at 476 nm using near field scanning optical microscopy
Backer SA, Suez I, Fresco ZM, Frechet JMJ, Conway JA, Vedantam S, Lee H, Yablonovitch E
Journal of Vacuum Science & Technology B, 25(4), 1336, 2007 |
| 5 |
Covalent formation of nanoscale fullerene and dendrimer patterns
Backer SA, Suez I, Fresco ZM, Rolandi M, Frechet JMJ
Langmuir, 23(5), 2297, 2007 |
| 6 |
AFM-induced amine deprotection: Triggering localized bond cleavage by application of tip/substrate voltage bias for the surface self-assembly of nanosized dendritic objects
Fresco ZM, Suez I, Backer SA, Frechet JMJ
Journal of the American Chemical Society, 126(27), 8374, 2004 |
