화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Mobility extraction for short channel UTBB-FDSOI MOSFETs under back bias using an accurate inversion charge density model
Trojman L, Ragnarsson LA, Collaert N
Solid-State Electronics, 154, 24, 2019
2 Electrical characterization of Random Telegraph Noise in Fully-Depleted Silicon-On-Insulator MOSFETs under extended temperature range and back-bias operation
Marquez C, Rodriguez N, Gamiz F, Ruiz R, Ohata A
Solid-State Electronics, 117, 60, 2016
3 Impact of fin length on threshold voltage modulation by back bias for Independent double-gate tunnel fin field-effect transistors
Mizubayashi W, Fukuda K, Mori T, Endo K, Liu YX, Matsukawa T, O'uchi S, Ishikawa Y, Migita S, Morita Y, Tanabe A, Tsukada J, Yamauchi H, Masahara M, Ota H
Solid-State Electronics, 111, 62, 2015
4 Dual Ground Plane EDMOS in 28 nm FDSOI for 5 V power management applications
Litty A, Ortolland S, Golanski D, Cristoloveanu S
Solid-State Electronics, 113, 42, 2015
5 Reliability of ultra-thin buried oxides for multi-V-T FDSOI technology
Besnard G, Garros X, Nguyen P, Andrieu F, Reynaud P, Van Den Daele W, Bourdelle KK, Schwarzenbach W, Toffoli A, Kies R, Delprat D, Reimbold G, Cristoloveanu S
Solid-State Electronics, 97, 8, 2014
6 Enhanced coupling effects in vertical double-gate FinFETs
Chang SJ, Bawedin M, Guo YF, Liu FY, Akarvardar K, Lee JH, Lee JH, Ionica I, Cristoloveanu S
Solid-State Electronics, 97, 88, 2014
7 Back biasing effects in tri-gate junctionless transistors
Park SJ, Jeon DY, Montes L, Barraud S, Kim GT, Ghibaudo G
Solid-State Electronics, 87, 74, 2013
8 Impact of local back biasing on performance in hybrid FDSOI/bulk high-k/metal gate low power (LP) technology
Fenouillet-Beranger C, Perreau P, Benoist T, Richier C, Haendler S, Pradelle J, Bustos J, Brun P, Tosti L, Weber O, Andrieu F, Orlando B, Pellissier-Tanon D, Abbate F, Richard C, Beneyton R, Gregoire M, Ducote J, Gouraud P, Margain A, Borowiak C, Bianchini R, Planes N, Gourvest E, Bourdelle KK, Nguyen BY, Poiroux T, Skotnicki T, Faynot O, Boeuf F
Solid-State Electronics, 88, 15, 2013
9 Parasitic bipolar impact in 32 nm undoped channel Ultra-Thin BOX (UTBOX) and biased Ground Plane FDSOI high-k/metal gate technology
Fenouillet-Beranger C, Perreau P, Boulenc P, Tosti L, Barnola S, Andrieu F, Weber O, Beneyton R, Perrot C, de Buttet C, Abbate F, Campidelli Y, Pinzelli L, Gouraud P, Margain A, Peru S, Bourdelle KK, Nguyen BY, Boedt F, Poiroux T, Faynot O, Skotnicki T, Boeuf F
Solid-State Electronics, 74, 32, 2012
10 A high efficient, low power, and compact charge pump by vertical MOSFETs
Sakui K, Endoh T
Solid-State Electronics, 54(10), 1192, 2010