화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Characterization of the active species in the afterglow of a nitrogen and helium atmospheric-pressure plasma
Babayan SE, Ding G, Nowling GR, Yang X, Hicks RF
Plasma Chemistry and Plasma Processing, 22(2), 255, 2002
2 Determination of the nitrogen atom density in the afterglow of a nitrogen and helium, nonequilibrium, atmospheric pressure plasma
Babayan SE, Ding G, Hicks RF
Plasma Chemistry and Plasma Processing, 21(4), 505, 2001
3 Reaction chemistry in the afterglow of an oxygen-helium, atmospheric-pressure plasma
Jeong JY, Park J, Henins I, Babayan SE, Tu VJ, Selwyn GS, Ding G, Hicks RF
Journal of Physical Chemistry A, 104(34), 8027, 2000
4 Tantalum etching with a nonthermal atmospheric-pressure plasma
Tu VJ, Jeong JY, Schutze A, Babayan SE, Ding G, Selwyn GS, Hicks RF
Journal of Vacuum Science & Technology A, 18(6), 2799, 2000
5 Etching polyimide with a nonequilibrium atmospheric-pressure plasma jet
Jeong JY, Babayan SE, Schutze A, Tu VJ, Park J, Henins I, Selwyn GS, Hicks RF
Journal of Vacuum Science & Technology A, 17(5), 2581, 1999