검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Contributions of resist polymers to innate material roughness Fedynyshyn TH, Astolfi DK, Goodman RB, Cann S, Roberts J Journal of Vacuum Science & Technology B, 26(6), 2281, 2008 |
| 2 |
Contribution of photoacid generator to material roughness Fedynyshyn TH, Pottebaum I, Astolfi DK, Cabral A, Roberts J, Meagley R Journal of Vacuum Science & Technology B, 24(6), 3031, 2006 |
| 3 |
Photospeed considerations for extreme ultraviolet lithography resists Dentinger PM, Hunter LL, O'Connell DJ, Gunn S, Goods D, Fedynyshyn TH, Goodman RB, Astolfi DK Journal of Vacuum Science & Technology B, 20(6), 2962, 2002 |
| 4 |
Infrared frequency selective surfaces fabricated using optical lithography and phase-shift masks Spector SJ, Astolfi DK, Doran SP, Lyszczarz TM, Raynolds JE Journal of Vacuum Science & Technology B, 19(6), 2757, 2001 |